| 发明名称 |
CLEANING METHOD |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning method which can easily remove firm deposits to the surface of a material to be treated without giving damage to the material to be treated. SOLUTION: The cleaning method is characterized in that the surface of the material to be treated is cleaned by making a cleaning agent containing an oxidizing agent, a chelating agent and fluorine compounds flow onto the surface of the above surface at high speed.
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| 申请公布号 |
JP2002113431(A) |
申请公布日期 |
2002.04.16 |
| 申请号 |
JP20000309172 |
申请日期 |
2000.10.10 |
| 申请人 |
TOKYO ELECTRON LTD;MITSUBISHI GAS CHEM CO INC |
发明人 |
GOTO HIDETO;NIUYA TAKAYUKI;MORI HIROYUKI;MATSUNAGA HIROTSUGU;ISHIHARA FUKUSABURO;KIMURA YOSHIYA;SOTOAKA RYUJI;GOTO TAKUYA;AOYAMA TETSUO;ABE KOJIRO |
| 分类号 |
B08B3/08;B08B3/10;C03C23/00;C11D3/32;C11D3/36;C11D3/39;C11D3/43;C11D7/28;C11D7/30;C11D7/32;C11D7/36;C11D7/50;C11D7/54;C11D7/60;C11D11/00;H01L21/304;H01L21/311;(IPC1-7):B08B3/08 |
主分类号 |
B08B3/08 |
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