发明名称 METHOD FOR EXPOSURE AND METHOD FOR EVALUATING EXPOSURE
摘要 PROBLEM TO BE SOLVED: To provide a method for exposure or a method for evaluating exposure in which evaluation of a sample is simplified by incorporating a procedure for automatically setting the light power-LD emission conditions so that the sample is exposed with an arbitrary exposure energy when it is specified. SOLUTION: The method for exposure comprises a step for determining a light power approximate value of a light emitting means from an arbitrary exposure energy value and a specific expression for calculating a light power approximate value per unit area, a step for determining the light power of the light emitting means when the light is not passed through a filter from the light power approximate value thus determined and the transmittance of the filter, a step for determining emission conditions of the light emitting means from the light power thereof when the light is not passed through a filter and a preset approximate function, a step for determining the number of sheets of filter from the emission conditions thus determined, and a step for exposing the surface of a carrier through a number of sheets of filter thus determined by driving the light emitting means under the emission conditions thus determined.
申请公布号 JP2002113898(A) 申请公布日期 2002.04.16
申请号 JP20000308845 申请日期 2000.10.10
申请人 RICOH CO LTD 发明人 MASUDA KIYOSHI
分类号 B41J2/44;(IPC1-7):B41J2/44 主分类号 B41J2/44
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