发明名称 Burn-in method and burn-in device
摘要 To provide a burn-in method and device capable of accelerating burn-in also in a peripheral circuit portion and a logic circuit portion as well as a memory cell array portion. A high temperature stress is applied to a wafer to be an evaluation object (Step SP11). Next, a low temperature stress and an electric stress are applied to the wafer (Step SP12). Then, it is decided whether a predetermined stress is applied to the wafer or not (Step SP13). If a result of the decision at the Step SP13 is "YES", it is decided whether a defective portion is generated in each chip of the wafer or not (Step SP14). Referring to a chip decided to have a failure generated thereon as a result of the decision at the Step SP14, it is decided whether repair is executed for the defective portion or not (Step SP15). If a result of the decision at the Step SP15 is "YES", the repair is executed for the defective portion (Step SP16).
申请公布号 US6372528(B1) 申请公布日期 2002.04.16
申请号 US20010813801 申请日期 2001.03.22
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 YAMAMOTO SHIGEHISA
分类号 G01R31/26;G01R31/28;G11C29/00;H01L21/66;(IPC1-7):G01R31/26 主分类号 G01R31/26
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