| 发明名称 |
Method and apparatus for monitoring and/or end point detecting a process |
| 摘要 |
The present invention describes a method of end point detecting a process. According to the present invention a surface characteristic is continually measured while the substrate is being processed. A predetermined change in the surface characteristic is utilized a signal and end to the processing step.
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| 申请公布号 |
US6374150(B2) |
申请公布日期 |
2002.04.16 |
| 申请号 |
US19980126552 |
申请日期 |
1998.07.30 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
REDINBO GREGORY F.;RAVI JALLEPALLY;RIVKIN MICHAEL |
| 分类号 |
H01L21/205;H01L21/02;H01L21/285;H01L21/31;H01L21/66;(IPC1-7):G06F19/00;G01J5/00 |
主分类号 |
H01L21/205 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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