发明名称 |
Optical system with improved durability for projection exposure apparatus and method for manufacturing optical system for projection exposure apparatus |
摘要 |
An optical system is provided in a projection exposure apparatus for processing an excimer laser beam. The optical system includes at least one optical member made of silica glass having a chlorine concentration of about 1 ppm or less, and at least one optical member made of silica glass having a chlorine concentration of about 1 ppm to about 200 ppm.
|
申请公布号 |
US6373554(B1) |
申请公布日期 |
2002.04.16 |
申请号 |
US19990437780 |
申请日期 |
1999.10.25 |
申请人 |
NIKON CORPORATION |
发明人 |
JINBO HIROKI;FUJIWARA SEISHI |
分类号 |
H01L21/027;C03B8/04;C03B20/00;C03C3/06;G02B13/14;G02B19/00;G03F7/20;(IPC1-7):G03B27/54;G03B27/42;C03C3/04 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|