发明名称 SURFACE TREATMENT COMPOSITION AND METHOD FOR SURFACE TREATMENT OF SUBSTRATE USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a surface treatment composition capable of preventing the surface of a substrate to be treated from being contaminated with metallic impurities run from the composition onto the substrate surface during making a treatment of the substrate, thus capable of stably affording a highly clean substrate surface, and to provide a method for the surface treatment of a substrate. SOLUTION: This surface treatment composition comprises an ethylenediaminephenol derivative (a salt thereof) of the general formula (I) (wherein, X1 and X2 are each a hydroxy group; Y1 to Y8 are each H, OH, a halogen atom, alkyl or the like, at least one of them not being H; Z1 to Z4 are each H, COOH or a phosphonic acid group; and R1 to R4 are each H, an alkyl or the like) which is characterized by containing <=5 ppm of at least one metallic element among Fe, Al and Zn.
申请公布号 JP2002114744(A) 申请公布日期 2002.04.16
申请号 JP20010207245 申请日期 2001.07.09
申请人 MITSUBISHI CHEMICALS CORP 发明人 MORINAGA HITOSHI
分类号 C11D7/32;C07C229/36;C07C229/76;C09K3/00;(IPC1-7):C07C229/76 主分类号 C11D7/32
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