发明名称 Semiconductor laser structure with an increased catastrophic optical damage level
摘要 A semiconductor laser structure is provided, which has an increased catastrophic optical damage (COD) level that allows the laser diode to have an increased life time of use. This semiconductor laser structure is characterized in the forming of a current-blocking structure proximate to the facets of the laser diode, which can help reduce the injected current into the facets, thereby increasing the COD level of the resulted laser diode. As a result, the resulted laser diode can operate at a high output power and nonetheless have an increased life time of use. Moreover, the forming of the current-blocking layers proximate to the facets can be performed simply by incorporating an additional photomask step in the fabrication without having equipment such as epitaxial equipment or vacuum equipment in the case of the prior art.
申请公布号 US6373875(B1) 申请公布日期 2002.04.16
申请号 US19990383757 申请日期 1999.08.26
申请人 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 YU YUAN-CHEN;CHIU CHIEN-CHIA;HO JIN-KUO
分类号 H01S5/16;H01S5/22;(IPC1-7):H01S5/00 主分类号 H01S5/16
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