ABRASIVE LIQUID SUPPLYING DEVICE, POLISHING DEVICE, AND OPERATING METHOD OF ABRASIVE LIQUID SUPPLYING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an abrasive liquid supplying device of simple structure capable of stirring the abrasive liquid in an abrasive liquid tank without using any special stirring machine and supplying the abrasive liquid with homogeneous concentration. SOLUTION: The abrasive liquid supplying device is to supply a prescribed abrasive liquid to a polishing device and equipped with a tank to store the abrasive liquid supplied to the polishing device and a pump to supply the liquid from the tank to the polishing device with a rate of flow Q, wherein the cross sectional area in the horizontal direction of the tank is made smaller than Q/V, where V represents the specified sedimentation velocity of the liquid. The flow velocity in the vertical direction in the tank can be made higher than the liquid sedimentation velocity, and liquid flowing in the tank causes its being stirred to allow the concentration to be kept constantly.