| 发明名称 |
Resist stripping composition |
| 摘要 |
A resist stripping composition contains 0.001 to 0.5% by weight of a fluorine compound, 50 to 99% by weight of an ether solvent and the balance being substantially water. With such a specific content range of the ether solvent, the resist stripping composition shows reduced corrosive properties when diluted with water in the rinsing step as well as shows complete removal of resist residues without causing corrosion of wiring materials and substrate materials.
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| 申请公布号 |
US6372410(B1) |
申请公布日期 |
2002.04.16 |
| 申请号 |
US20000668473 |
申请日期 |
2000.09.25 |
| 申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC. |
发明人 |
IKEMOTO KAZUTO;ABE KOJIRO;AOYAMA TETSUO |
| 分类号 |
H01L21/308;C11D7/08;C11D7/10;C11D7/26;C11D7/32;C11D11/00;G03F7/40;G03F7/42;H01L21/02;H01L21/027;H01L21/306;H01L21/311;H01L21/3213;(IPC1-7):G03C5/00 |
主分类号 |
H01L21/308 |
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