发明名称 APERTURE FOR EXPOSURE APPARATUS
摘要 PURPOSE: An aperture for an exposure apparatus is provided to improve productivity while maintaining an increase of resolution and a depth of focus(DOF), by forming a circular open region in the center of a conventional dipole aperture while not affecting the resolution and DOF. CONSTITUTION: The dipole aperture is of a circular type. An inner pattern(3) of a ring type which is quadrisected is formed in the dipole aperture. One pair of the separated patterns confronting each other supply the first open region(1), and the other pair of the separated patterns supply a shielding region(2) just like regions except the inner pattern. The second open region(4) of a circular type is formed in the center of the inner pattern.
申请公布号 KR20020028015(A) 申请公布日期 2002.04.15
申请号 KR20000058886 申请日期 2000.10.06
申请人 HYNIX SEMICONDUCTOR INC. 发明人 PARK, JEONG SU
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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