| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam drawing apparatus capable of providing a fine pattern when the patterns are aligned on a mask blank, and to provide a mask having the fine pattern. SOLUTION: The electron beam drawing apparatus for drawing a lithographic mask comprises an electron gun for emitting electrons for alignment, an electron optic system for converging and emitting the emitted electrons on the mask blank, and a holder stage for holding and moving the blank. The apparatus further comprises a means for suppressing the reflection of the electron beam from the holder stage or an influence of the reflection. |
