| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleanliness managing method in a chamber, which makes the cost a facility and maintenance inexpensive and can maintain the inside of the chamber clean, without making impurities adhere into the chamber by setting the exhaust ability of the chamber performing a process to the extent that pressure required for performing the process can be obtained, and to provide the process device. SOLUTION: When pressure in the chamber 1 is set low, and cleanliness in the chamber 1 performing an object to be treated is managed, a mass analyzer (QMS) 2 is fitted to the chamber 1, and the mass analyzer 2 detects degassing quantity and/or leakage quantity in the chamber 1. Thus, cleanliness is managed. By making a process gas or an inert gas flow continuously and making the chamber inside not a high vacuum, cleanliness in the chamber is maintained.
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