发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus, which is provided with a reaction chamber processing a substrate and an exhaust pump for exhausting the reaction chamber and in which the down time of the device is shortened, device managing cost is reduced, and the life time of the exhaust pump is improved. SOLUTION: The semiconductor manufacturing device is provided with the reaction chamber 10, the exhaust pump 3 evacuating the reaction chamber 20 through piping 11 and a trap cooling part 1 and a trap tank part 2, which are connected to the evacuation side of the exhaust pump 3. In the trap cooling part 1, non-reactive raw material and by-product production in exhaust gas are condensed efficiently, condensed matter is collected in the trap tank part 2, it does not become the cause for clogging on the exhaust side of the exhaust pump 3, and the maintenance period for dissolving clogging can be made significantly long.
申请公布号 JP2002110660(A) 申请公布日期 2002.04.12
申请号 JP20000295711 申请日期 2000.09.28
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 MATSUYAMA NAOKO;HIROSE YOSHIRO;YASUI TAKESHI;NISHINO TOYOAKI
分类号 B01J19/00;C23C16/44;H01L21/31;(IPC1-7):H01L21/31 主分类号 B01J19/00
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