发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To suppress mobility deterioration of carriers in the channel of a MISFET. SOLUTION: B(boron) and N(nitrogen), which have concentration peak at a position nearer to the surface of a semiconductor substrate than to the position of the concentration peak of the B and electrically inactivates the B, are introduced into the channel of the MISFET.
申请公布号 JP2002110962(A) 申请公布日期 2002.04.12
申请号 JP20000295229 申请日期 2000.09.27
申请人 TOSHIBA CORP 发明人 AKASAKA YASUSHI
分类号 H01L29/78;(IPC1-7):H01L29/78 主分类号 H01L29/78
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