发明名称 |
LITHOGRAPHIC PROJECTOR, METHOD FOR MANUFACTURING DEVICE AND DEVICE MANUFACTURED THEREBY |
摘要 |
PROBLEM TO BE SOLVED: To provide a means for reducing a damage due to a high-speed ion or the like to a mirror included in a radiation system in a lithographic projector having a plasma radiation source. SOLUTION: A hydrocarbon gas for generating a protective cap layer on the surface of the mirror is supplied to a space for housing a mirror in the lithographic projector. A partial pressure of the hydrocarbon gas in the space is controlled in response to the change of a background pressure in the space and/or the reflectivity of the mirror, and a thickness of the cap layer on the mirror is maintained in an allowable range. When the cap layer and/or an additional multilayer is provided on the mirror to remove sputtering of the upper layer of the mirror, a partial pressure of the hydrocarbon is increased, and a clean surface of the mirror is thereby provided. The used hydrocarbon may be an alcohol. In this case, the generated cap layer is self-finished.
|
申请公布号 |
JP2002110539(A) |
申请公布日期 |
2002.04.12 |
申请号 |
JP20010262809 |
申请日期 |
2001.08.31 |
申请人 |
ASM LITHOGRAPHY BV;KONINKL PHILIPS ELECTRONICS NV |
发明人 |
BANINE VADIM YEVGENYEVICH;JONKERS JEROEN |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|