发明名称 LITHOGRAPHIC PROJECTOR, METHOD FOR MANUFACTURING DEVICE AND DEVICE MANUFACTURED THEREBY
摘要 PROBLEM TO BE SOLVED: To provide a means for reducing a damage due to a high-speed ion or the like to a mirror included in a radiation system in a lithographic projector having a plasma radiation source. SOLUTION: A hydrocarbon gas for generating a protective cap layer on the surface of the mirror is supplied to a space for housing a mirror in the lithographic projector. A partial pressure of the hydrocarbon gas in the space is controlled in response to the change of a background pressure in the space and/or the reflectivity of the mirror, and a thickness of the cap layer on the mirror is maintained in an allowable range. When the cap layer and/or an additional multilayer is provided on the mirror to remove sputtering of the upper layer of the mirror, a partial pressure of the hydrocarbon is increased, and a clean surface of the mirror is thereby provided. The used hydrocarbon may be an alcohol. In this case, the generated cap layer is self-finished.
申请公布号 JP2002110539(A) 申请公布日期 2002.04.12
申请号 JP20010262809 申请日期 2001.08.31
申请人 ASM LITHOGRAPHY BV;KONINKL PHILIPS ELECTRONICS NV 发明人 BANINE VADIM YEVGENYEVICH;JONKERS JEROEN
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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