发明名称 PLASMA PROCESSING DEVICE AND PLASMA LIGHTING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a low cost plasma processing device that is excellent in starting with steady lighting of plasma and capable of reducing the time and trouble of maintenance, and further that enables to start plasma processing immediately after the plasma lighting. SOLUTION: The plasma processing device is comprised of a reaction container 2 of which one side is opened as a blowing outlet 1 and plural electrodes 3, 4. A plasma is generated by generating a discharge inside the reaction container under the pressure in the vicinity of the atmospheric pressure by impressing a voltage between the electrodes 3, 4. The plasma generated in the reaction container 2 is blown in jet form out of the blowing outlet 1. The plasma processing device comprises a light source 5 for starting discharge by irradiating a light in the reaction container 2 in the state wherein a voltage is impressed between the electrodes 3, 4. By irradiating a light in the reaction container 2 from the light source 5, residual electrons inside the reaction container 2 can be increased.
申请公布号 JP2002110398(A) 申请公布日期 2002.04.12
申请号 JP20000294888 申请日期 2000.09.27
申请人 MATSUSHITA ELECTRIC WORKS LTD 发明人 TAGUCHI NORIYUKI;SAWADA KOJI
分类号 H05H1/24;C23C16/507;C23F4/00;H01L21/205;H01L21/302;H01L21/3065 主分类号 H05H1/24
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