| 摘要 |
PROBLEM TO BE SOLVED: To suppress the channeling of the reaction gas of a substrate processor and to improve the product quality and yield of its substrates. SOLUTION: The substrate processor has a heating means for heating substrates, a reaction tube 3 for defining the processing space of the substrates, and a substrate holding means for holding the substrates inside of the reaction tube to introduce a reaction gas into the reaction tube and process the substrates and exhaust the gas after the process. In the reaction tube of the substrate processor, a plurality of exhaust ports 17, 18 are provided and branching pipes 15, 16 having the same flow-passage resistance are so connected respectively with the ports as to exhaust the gas via the branching pipes.
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