| 摘要 |
PROBLEM TO BE SOLVED: To provide a projection aligner which can highly precisely transfer a reticle pattern on a photosensitive substrate with illuminating light having high uniformity, and a method of manufacturing a micro device by using this projection aligner. SOLUTION: There are provided an illumination optical system 1 for illuminating a reticle 3 on which a predetermined pattern is formed, a projection optical system 8 for projecting and exposing the pattern image of the reticle 3 illuminated by the illumination optical system 1 on a photosensitive substrate 9, and a scanning device MT for scanning the reticle 3 and the photosensitive substrate 9 against the projection optical system 8. The illumination optical system 1 has a light restricting member A1, which adjusts light intensity distribution of illuminating light at least at one position either on the light source LS side or the reticle 3 side interposing a predetermined position 130 optically conjugated with an imaging surface of the projection optical system 8. The light restricting member A1 satisfies a predetermined condition of a distance D from the predetermined position to the light restricting member A1. |
