| 摘要 |
PROBLEM TO BE SOLVED: To clean a semiconductor wafer without having to use harmful chemical liquid, such as a pyranner and an organic solvent. SOLUTION: Ultra pure water is heated for generating vapor, and the vapor is sprayed onto the surface of the semiconductor wafer at a temperature of 85 deg.C or higher. Even though the vapor is sprayed with a low pressure of 4.5 kg/cm2 or lower, photoresist or organic matters is removed from the surface of the semiconductor wafer.
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