发明名称 |
EPITAXIAL GROWTH OF NITRIDE SEMICONDUCTOR ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor element in which a transition density is reduced. SOLUTION: The semiconductor element 10 comprises polynucleus 2 between a board 1 and an AlGaInN compound semiconductor 3. The transition density induced due to a difference of crystal lattice between the board 1 and the semiconductor 3 is remarkably reduced, and a growth of the semiconductor 3 is improved. |
申请公布号 |
JP2002110545(A) |
申请公布日期 |
2002.04.12 |
申请号 |
JP20000288837 |
申请日期 |
2000.09.22 |
申请人 |
UNITED EPITAXY CO LTD |
发明人 |
ZUAN ZUU SON;TSUAI ZUON RYAN |
分类号 |
C30B29/38;C30B25/02;H01L21/20;H01L21/205;H01L29/06;H01L31/0328;H01L33/00;H01L33/12;H01L33/16;H01S5/323;H01S5/343 |
主分类号 |
C30B29/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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