发明名称 EPITAXIAL GROWTH OF NITRIDE SEMICONDUCTOR ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor element in which a transition density is reduced. SOLUTION: The semiconductor element 10 comprises polynucleus 2 between a board 1 and an AlGaInN compound semiconductor 3. The transition density induced due to a difference of crystal lattice between the board 1 and the semiconductor 3 is remarkably reduced, and a growth of the semiconductor 3 is improved.
申请公布号 JP2002110545(A) 申请公布日期 2002.04.12
申请号 JP20000288837 申请日期 2000.09.22
申请人 UNITED EPITAXY CO LTD 发明人 ZUAN ZUU SON;TSUAI ZUON RYAN
分类号 C30B29/38;C30B25/02;H01L21/20;H01L21/205;H01L29/06;H01L31/0328;H01L33/00;H01L33/12;H01L33/16;H01S5/323;H01S5/343 主分类号 C30B29/38
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