| 摘要 |
PROBLEM TO BE SOLVED: To provide a polymer-removing apparatus and a polymer removal method for preventing polymer from readhering to a wafer surface and for reducing the polymer on the wafer surface, by reducing the temperature of a cleaning liquid passing through the filtering section of a circulation filtering means, as compared with the temperature of the cleaning liquid at a cleaning treatment section. SOLUTION: This polymer-removing device has a contact means for bringing a contact liquid into contact with the polymer on a wafer to contain the polymer into the contact liquid, a cleaning tank 7, having cleaning liquid for removing the contact liquid on the wafer to carry out cleaning treatment, and a circulation filtration means for circulating and filtering the cleaning liquid. Also, a heater 14 is provided in a cooler 15 for cooling the cleaning liquid. prior to passing through a filtration section (filter) 13, and in the cleaning tank 7.
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