| 摘要 |
PROBLEM TO BE SOLVED: To form antireflection films which have very fine line width and do not generate pattern peeling and development residues, in a solid-state imaging element. SOLUTION: A planarized film 7 is formed on an imaging region 5 having a plurality of light receiving sensor parts 3. Antireflection films 8 are buried in the planarized film 7 except at least the parts corresponding to the light- receiving sensor parts 3.
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