| 摘要 |
<p>Devices and methods for differential numerical aperture analysis of samples, utilizing angle-of-incidence measurements resulting from variable illumination (30) or observation (40) numerical apertures, or both. Metrology applications are provided, and more particularly including scatterometer, ellipsometer and similar analysis methods, including bidirectional reflectance or transmission distribution function measurement. The provided devices and methods enable analysis of critical dimensions of samples utilizing a minimum of moving parts, with range of striking or scattering angles varied by means of variable numerical aperture or apertures (30, 40).</p> |
