| 摘要 |
A polishing apparatus is provided with a turn table, on which an air passage is formed, and a polishing pad mount plate, on which a polishing pad is stuck. The polishing pad mount plate is detachably attached on the turn table. When the polishing pad mount plate is detached from the turn table, a separation fluid supplying part supplies air as separation fluid between the turn table and the polishing pad mount plate through the air passage. |
