发明名称 |
METHOD AND APPARATUS FOR MEASURING WAVEFRONT ABERRATIONS |
摘要 |
An apparatus and method for measuring wavefront aberrations. The apparatus comprises a reflecting device (128) for reflecting selected portions of the wavefront (126), an imaging device (132) for capturing information related t o the selected portions, and a processor (136) for calculating aberrations of the wavefront from the captured information. The method comprises reflecting selected portions of a wavefront (126) onto the imaging device (132), capturing information related to the selected portions, and processing the captured information to derive the aberrations.
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申请公布号 |
CA2424169(A1) |
申请公布日期 |
2002.04.11 |
申请号 |
CA20012424169 |
申请日期 |
2001.09.21 |
申请人 |
JOHNSON & JOHNSON VISION CARE, INC. |
发明人 |
ROSS, DENWOOD F., III;DAVIS, BRETT A.;ROFFMAN, JEFFREY H.;ISKANDER, DAOUD R.;COLLINS, MICHAEL J. |
分类号 |
G01M11/02;A61B3/10;A61B3/103;G01J9/00;(IPC1-7):A61B3/103 |
主分类号 |
G01M11/02 |
代理机构 |
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地址 |
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