| 发明名称 |
ELECTRON BEAM EXPOSURE SYSTEM |
| 摘要 |
An electron beam exposure system (100) comprising an electron gun (10) for generating a plurality of electron beams, a multi-axis electronic lens (62) for converging the plurality of electron beams independently, a deflecting unit (60) for deflecting the plurality of electron beams independently, and a wafer stage (46) having a differential pumping type air bearing structure.
|
| 申请公布号 |
WO0229868(A1) |
申请公布日期 |
2002.04.11 |
| 申请号 |
WO2001JP08667 |
申请日期 |
2001.10.02 |
| 申请人 |
ADVANTEST CORPORATION;HAMAGUCHI, SHINICHI;MANABE, KEIJI;YASUDA, HIROSHI |
发明人 |
HAMAGUCHI, SHINICHI;MANABE, KEIJI;YASUDA, HIROSHI |
| 分类号 |
G03F7/20;H01J37/20;H01J37/305;H01J37/317;H01L21/027;H01L21/68;(IPC1-7):H01L21/027;F16C32/06 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
