| 发明名称 |
DETERMINATION OF CENTER OF FOCUS BY DIFFRACTION SIGNATURE ANALYSIS |
| 摘要 |
The present invention provides methods for determination of parameters in lithographic devices and applications by diffraction signature difference analysis, including determination of center of focus in lithography devices and applications, such as for photoresist lithographic wafer processing.
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| 申请公布号 |
US2002041373(A1) |
申请公布日期 |
2002.04.11 |
| 申请号 |
US20010946104 |
申请日期 |
2001.09.04 |
| 申请人 |
LITTAU MICHAEL EUGENE;RAYMOND CHRISTOPHER J. |
发明人 |
LITTAU MICHAEL EUGENE;RAYMOND CHRISTOPHER J. |
| 分类号 |
G01M11/02;G03F7/20;H01L21/027;(IPC1-7):G01M11/02 |
主分类号 |
G01M11/02 |
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