发明名称 Verfahren und Vorrichtung zum Abscheiden insbesondere organischer Schichten im Wege der OVPD
摘要 The invention relates to a method and a device for depositing especially, organic layers. In a heated reactor (1), a non-gaseous starting material (3) that is stored in a source (I) in the form of a container (2) is transported from said source (I) to a substrate (II) by a carrier gas (4) in gaseous form (5) and is deposited on said substrate (II). The rate of production of the gaseous starting material by the source is unpredictable due to a heat input that cannot be regulated in a reproducible manner and due to cooling resulting from the carrier gas. The invention therefor provides that the preheated (6) carrier gas (4) washes through the starting material (3) from bottom to top, the starting material being kept essentially isothermal in relation to the carrier gas by the heated (7) container walls (13).
申请公布号 DE10048759(A1) 申请公布日期 2002.04.11
申请号 DE2000148759 申请日期 2000.09.29
申请人 AIXTRON GMBH 发明人 JUERGENSEN, HOLGER;STRAUCH, GERD;SCHWAMBERA, MARKUS
分类号 H05B33/10;C23C14/12;C23C14/18;C23C14/24;C23C16/44;C23C16/448;H01L51/50;(IPC1-7):C23C14/12;C23C14/22 主分类号 H05B33/10
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