| 摘要 |
PROBLEM TO BE SOLVED: To obtain a black matrix in which etching rate in patterning is controlled in such a way that the etching rate is made equal to that of a metal chromium film and which has satisfactory acid, alkali, heat and water resistances in a process for producing a color filter. SOLUTION: At least one light shielding film 2 and, optionally, a low reflection film 3 are formed on a transparent substrate 1 and the composition of the light shielding film is composed essentially of 40-80 mass% Ni, 10-59 mass%, 0.5-8 mass% Ta+Nb, 0.5-10 mass% Fe+Al and 0-7 mass% Zr. |
