发明名称 Supercritical drying method and supercritical drying apparatus
摘要 According to a supercritical drying method of this invention, a substrate having a pattern is dipped in water and rinsed with water. Then, the substrate is placed in the reaction chamber of a predetermined sealable vessel, and surfactant-added liquid carbon dioxide is introduced into the reaction chamber. The substrate is dipped in surfactant-added liquid carbon dioxide, and liquid carbon dioxide is changed to the supercritical state. After that, supercritical carbon dioxide is gasified. <IMAGE>
申请公布号 EP1106946(A3) 申请公布日期 2002.04.10
申请号 EP20000250417 申请日期 2000.12.01
申请人 NIPPON TELEGRAPH AND TELEPHONE CORPORATION 发明人 HIDEO, NAMATSU
分类号 H01L21/304;F26B5/00;G03F7/40;H01L21/306 主分类号 H01L21/304
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