| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive material and photosensitive thin film each capable of forming patterns without developing step and only with photoirradiation and capable of realizing high sensitivity, and to provide a method for forming patterns using the photosensitive material. SOLUTION: The photosensitive material and the photosensitive thin film each comprise a polymeric material having azobenzene skeleton and a liquid crystal material and the method for forming patterns is characterized by comprising a step, wherein a thin film of photosensitive composition comprising a polymeric material having azobenzene skeleton and a liquid crystal material is formed, and a step, wherein movement of the photosensitive composition is caused by pattern exposure of the thin film.
|
