发明名称 |
AUTOMATIC DEVELOPING MACHINE FOR PHOTOSENSITIVE MATERIAL |
摘要 |
PROBLEM TO BE SOLVED: To enable rapid processing and to obtain rinsing processing performance or always consistent with stabilization processing performance by adequately supplying a rinsing liquid or stabilizer. SOLUTION: A rinsing processing step or stabilization processing step for the automatic developing machine 1 for photosensitive materials having the rinsing processing step or stabilization processing step in succession to a development processing step and a fixation processing step, and further having the drying step has a liquid supplying means 81 for aerially transporting the photosensitive materials in a hermetically closed space and supplying rinsing water or the stabilizing liquid to the aerially transported photosensitive materials, a process step heating and temperature control means 82 for controlling the temperature of the pseudo-hermetic space to a high temperature by the steam generated by heating the waste liquid of the rinsing liquid or stabilizing liquid which drops from the photosensitive materials and a liquid heating and temperature control means 83 for heating the supplied rinsing liquid or stabilizing liquid.
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申请公布号 |
JP2002107892(A) |
申请公布日期 |
2002.04.10 |
申请号 |
JP20000298268 |
申请日期 |
2000.09.29 |
申请人 |
KONICA CORP |
发明人 |
KUREMATSU MASAYUKI;HASHIMOTO HIROYUKI;KOBAYASHI HIROAKI |
分类号 |
G03D3/00;G03D5/04;G03D13/00;(IPC1-7):G03D3/00 |
主分类号 |
G03D3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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