| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material, having low fog and a high Dmax (maximum density), less liable to the rise of fog in storage and having low temperature and humidity dependence in development, as a heat developable photosensitive material in particular for a photomechanical process and particularly for a scanner or an image setter. SOLUTION: In the heat developable photosensitive material, having an image forming layer containing at least a non-photosensitive silver salt, photosensitive silver halide and a binder and a protective layer situated on the side of the image-forming layer farther form the base on the base, at least one compound of formula (1), (2) or (3) is contained on the side with the image-forming layer and the NH4+ content of all layers on the same side as a layer containing the compound is <=0.06 mmol per 1 m2 of the base. In the formula (1), R1-R3 each represents H or a substituent; Z is an electron withdrawing group; and R1 and Z, R2 and R3, R1 and R2, or R3 and Z may bond to each other, to form a cyclic structure. In the formula (2), R4 is a substituent. In the formula (3), X and Y are each H or a substituent; A and B are each alkoxy, alkylthio, alkylamino, aryloxy, arylthio, anilino, heterocyclic oxy, heterocyclic thio or heterocyclic amino; and X and Y, or A and B may bond to each other, to form a cyclic structure.
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