| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a device for the formation of pattern data in a scribe and a method for forming the pattern data in the scribe so as to reduce the work of arranging data by storing the basic mark groups to be arranged in the scribe as a library. SOLUTION: The maximum region which includes the whole occupancy region when the basic marks 107, 108, 109 are arranged with their centers aligned coincides with the occupancy region 19 of the basic mark 109. A light shielding film is left in the scribe by photomasks 11, 13, and this means that the auxiliary pattern for the basic mark 107 is defined by subtracting the occupancy region of the basic mark 107 from the maximum region 19 and thereby, a basic mark 17 with the auxiliary pattern is formed. A basic mark 18 is also formed as the occupancy region for the basic mark 108 by adding the region coincident with the maximum region. The basic marks 17, 18, 19 are arranged with their centers aligned and registered as a pattern data group library 20.</p> |
