| 摘要 |
PROBLEM TO BE SOLVED: To provide a photographic element, including the arrangement of a reference calibration patch, with which the influence due to a linear defect on the photographic element and flare is reduced. SOLUTION: The reference calibration patches, formed by an exposure sequence on the photographic element having the linear defect in a fixed direction, are arranged to be in a two-dimensional array, and exposure is allotted to the reference calibration patches in the array so that the most neighboring patch in the fixed direction, where many linear defects appear not to be the nearest neighboring patch in the exposure sequence, whereby the influence of the linear defect is reduced. Then, the maximum number of the steps of the exposure sequence between one reference calibration patch and the most neighboring patch of one reference calibration patch in an optional direction is smaller than a specified number, whereby the influence of the flare is reduced.
|
