发明名称 SULFONAMIDEPHENOL OR ANILINE-BASED COMPOUND AND HALOGENATED SILVER PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a halogenated silver photosensitive material having a high maximum concentration of its image and excellent in discrimination. SOLUTION: This photosensitive material is obtained by using a compound expressed by the following general formula (1) (wherein, A is hydroxyl, a substituted or non-substituted amino or the like; R1 to R4 are each H, a halogen atom, cyano, an alkyl, an aryl or the like; and R5 is a pseudo aromatic ring).
申请公布号 JP2002105044(A) 申请公布日期 2002.04.10
申请号 JP20000297043 申请日期 2000.09.28
申请人 FUJI PHOTO FILM CO LTD 发明人 TAGUCHI TOSHIKI
分类号 G03C7/392;C07C311/14;G03C1/42;G03C1/498;G03C8/40;(IPC1-7):C07C311/14 主分类号 G03C7/392
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