| 摘要 |
PROBLEM TO BE SOLVED: To realize a method for manufacturing a microstructure array such as a microlens array or the like equipped with an alignment marker for highly accurate alignment or the like, easy and high in controllability and capable of reducing the intermediate plane distribution of the microstructure array and the radius of curvature thereof. SOLUTION: First mask layers 3 are formed on a substrate 1 having conductive parts 2, a plurality of aperture parts 4 for microstructures are formed to the first mask layers 2 at a proper interval. Aperture parts 5 for alignment markers are formed by the same process, and the conductive parts 2 are used as cathodes to form aperture parts and first plating layers 6 or electrodeposition layers through the aperture parts 5 and 6. The interval between the aperture parts 5 and the aperture parts 4 for recent microstructures is opened by one pitch of the aperture parts, and the ratio of the area of the aperture parts 5 for the alignments markers occupying the area of the region surrounded by the aperture parts present in the periphery of the aperture parts 5 is less than 1/2. |
