发明名称 Die-based in-fab process monitoring and analysis system for semiconductor processing
摘要 A method is provided for manufacturing, the method including processing a workpiece in a plurality of processing steps and measuring characteristics of the processing performed on the workpiece in at least two of the plurality of processing steps. The method also includes displaying the characteristics measured by overlaying the characteristics measured at each of the at least two of the plurality of processing steps to display a final resulting workpiece.
申请公布号 US6368884(B1) 申请公布日期 2002.04.09
申请号 US20000548142 申请日期 2000.04.13
申请人 ADVANCED MICRO DEVICES, INC. 发明人 GOODWIN GREG;OSHELSKI ANASTASIA LYNN
分类号 H01L21/66;(IPC1-7):G01R31/26 主分类号 H01L21/66
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