THIN FILM SEMICONDUCTOR MANUFACTURING APPARATUS

摘要

PROBLEM TO BE SOLVED: To allow forming and etching good semiconductor thin films and insulative films on a large glass substrate on which TFTs used for a LCD or an OLED, formed by using a remote plasma method. SOLUTION: Ends of a plurality of cylindrical chambers respectively including a plasma generator are coupled to a common space in which the substrate inserted. A plasma producing gas introduced from other ends of the cylindrical chambers, is excited to the plasma by a high frequency electric field radiated from working coils disposed in the middle of the cylindrical chambers. A raw material gas for forming the film is discharged from many holes disposed on supplying pipes installed in the X and Y directions adjacent to a surface of the substrate. A tube lamp and an exhausting pipe are installed adjacent to the supplying pipe in parallel. Three components are united and alternately scan the entire substrate in the X and Y directions. A heater is built in a substrate support.