| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation sensitive composition effectively responding to electronic beams and excellent in roughness, etching resistance, and sensitivity and capable of forming a minute pattern highly accurately and stably. SOLUTION: This radiation sensitive composition contains the following (A) and (B): (A) a compound represented by formula (1) (Wherein, R1, R2 and R3 each independently represent an acid-dissociable functional group selected from the group consisting of hydrogen atom or a substituted methyl group, a 1-substituted ethyl group, a 1-substituted-n-propyl group, a 1-branched alkyl group, a silyl group, an acyl group, a 1-substituted alkoxymethyl group and a cyclic acid-dissociable group. At least one of R1, R2 and R3 is an acid- dissociable functional group). (B) a compound generating an acid by irradiation with radioactive rays. |
