发明名称 |
POSITIVE TYPE PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE, METHOD OF PRODUCING THE SAME AND PLATE MAKING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of producing a positive type photosensitive planographic printing plate satisfying stable performance without seasonal variations and the shortening of production process at the same time for the object of forming a positive type photosensitive composition film suitable for direct recording with a semiconductor laser, YAG laser or the like and having high sensitivity, good preservability, chemical resistance and resistance to printing wear. SOLUTION: The method of producing the positive type photosensitive planographic printing plate characterized in that after the photosensitive layer is set by coating, and a dry treatment is carried out at a temperature of 30-100 deg.C and at a dew point of 5-30 deg.C in the method of producing the positive type photosensitive planographic printing plate formed by setting of a photosensitive layer containing a photosensitizing dye capable of absorbing at least one beam in the wave length range of 600 nm-1300 nm, a novolak resin and/or a polyvinyl phenol resin by coating on a supporting body. |
申请公布号 |
JP2002099099(A) |
申请公布日期 |
2002.04.05 |
申请号 |
JP20000292461 |
申请日期 |
2000.09.26 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
HIDAKA KATSUHIKO;FUKUI MAKOTO;NAGAO SHIGEKI |
分类号 |
G03F7/004;B41C1/055;B41N1/14;G03F7/00;G03F7/032;G03F7/38 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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