发明名称 NITRIDE SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a nitride semiconductor light-emitting element, having few crystal defects and superior characteristics. SOLUTION: In a nitride semiconductor light-emitting element, having a structure consisting of a plurality of layers 102-112 made of a nitride semiconductor on a GaN substrate 101, a transition inhibiting layer 104 consisting of a nitride semiconductor and having carbon, is included between a luminescent layer 107 and a substrate 101. The transposition inhibiting layer 104 is an AlGaN layer containing carbon with the density of 1014 cm3-1020 cm-3. The thickness of the transition inhibiting layer 104 is 40 nm-0.7μm. The transition inhibiting layer 104 can effectively prevent the generation of transition caused by lattice mismatch between an n-type GaN layer 102 and an n-type AlGaN clad layer 103.
申请公布号 JP2002100837(A) 申请公布日期 2002.04.05
申请号 JP20000289805 申请日期 2000.09.25
申请人 SHARP CORP 发明人 UEDA YOSHIHIRO;YUASA TAKAYUKI;TSUDA YUZO;OGAWA ATSUSHI;ARAKI MASAHIRO;TAKAKURA TERUYOSHI
分类号 H01S5/343;H01S5/323;(IPC1-7):H01S5/343 主分类号 H01S5/343
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