发明名称 THERMALLY DEVELOPABLE PHOTOSENSITIVE MATERIAL AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a method capable of manufacturing a thermally developable photosensitive material with good performances for preserving image and sensitivity even if it is applied in double layers at the same time. SOLUTION: In the method for manufacturing the thermally developable photosensitive material, (1) a coating liquid for a photosensitive layer including an organic silver salt, a reducing agent for a silver ion, a photosensitive silver halide and a binder, (2) a coating liquid for an intermediate layer and (3) a coating liquid for a surface protecting layer, are applied and dried on one surface of a support so that the photosensitive layer, the intermediate layer and the surface protecting layer are formed in order from nearer one to the support. Each embrocation for the light-sensitive layer, for the intermediate layer and for the surface protecting layer includes an organic solvent which has an amount of 10 wt.% or more of all amount of the solvent. The embrocation for the intermediate layer includes particles which have an average diameter of 0.1-30 nm.
申请公布号 JP2002099058(A) 申请公布日期 2002.04.05
申请号 JP20000289815 申请日期 2000.09.25
申请人 FUJI PHOTO FILM CO LTD 发明人 TAMURA YUTAKA
分类号 G03C1/74;G03C1/76;(IPC1-7):G03C1/74 主分类号 G03C1/74
代理机构 代理人
主权项
地址