发明名称 ELECTROSTATIC CHUCK AND ITS FABRICATION METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a high quality and long life electrostatic chuck. SOLUTION: An electrostatic chuck which is for fixing a substrate to be treated by electrostatistic attraction in a vacuum treatment vessel. The chuck is provided with a thin film electrode (1) having a first plane in the side of the substrate to be treated, a second plane facing to the first plane, and an insulator layer (2) directly formed on the surface of the first thin film electrode (1). A part (2a) formed on the first plane of the above thin film electrode is composed of a polyimide layer.</p>
申请公布号 JP2002100669(A) 申请公布日期 2002.04.05
申请号 JP20000287587 申请日期 2000.09.21
申请人 TOSHIBA CORP 发明人 SAKAI ITSUKO;OKUMURA KATSUYA
分类号 B23Q3/15;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 主分类号 B23Q3/15
代理机构 代理人
主权项
地址