发明名称 |
ELECTROSTATIC CHUCK AND ITS FABRICATION METHOD |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a high quality and long life electrostatic chuck. SOLUTION: An electrostatic chuck which is for fixing a substrate to be treated by electrostatistic attraction in a vacuum treatment vessel. The chuck is provided with a thin film electrode (1) having a first plane in the side of the substrate to be treated, a second plane facing to the first plane, and an insulator layer (2) directly formed on the surface of the first thin film electrode (1). A part (2a) formed on the first plane of the above thin film electrode is composed of a polyimide layer.</p> |
申请公布号 |
JP2002100669(A) |
申请公布日期 |
2002.04.05 |
申请号 |
JP20000287587 |
申请日期 |
2000.09.21 |
申请人 |
TOSHIBA CORP |
发明人 |
SAKAI ITSUKO;OKUMURA KATSUYA |
分类号 |
B23Q3/15;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 |
主分类号 |
B23Q3/15 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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