| 摘要 |
PURPOSE: A solvent blend for use in high purity precursor removal is provided to maximize the cleaning efficiency, and minimize the environmental impact for use in cleaning the interior ultrahigh purity piping walls of a chemical delivery system. CONSTITUTION: A process for cleaning a manifold which delivers high purity source chemical from a high purity source chemical container to a point of use after delivery of the high purity source chemical through the manifold is discontinued, comprises the steps of evacuating the manifold by connection to a source of vacuum, terminating the evacuation, introducing at least one solvent for the high purity source chemical into the manifold from at least one source of the at least one solvent, dissolving any residual high purity source chemical in the manifold into the at least one solvent, venting a resulting mixture of residual high purity source chemical and solvent from the manifold, and purging the manifold by connection to a source of inert gas.
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