| 摘要 |
<p>The invention concerns an illumination system, particularly for microlithography with wavelengths ≤ 193 nm, comprising: a primary light; a first optical component; a second optical; an image plane component; and an exit pupil; wherein said first optical component transforms said primary light source into a plurality of secondary light sources that are imaged by said second optical component in said exit pupil; wherein said first optical component includes a first optical element having a plurality of first raster elements, that are imaged into said image plane producing a plurality of images being superimposed at least partially on a field in said image plane, wherein said plurality of first raster elements have negative optical power.</p> |
