发明名称 |
Process for studying structures on a wafer places circuits with test structures on the wafer light mask to detect electric parameters |
摘要 |
A process for studying structures on a wafer which have been produced using a light mask on the wafer comprises having the test circuits (4) and test structures placed on the mask in a given reference position. The test and/or the illumination process evaluate a place-dependent electrical parameter.
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申请公布号 |
DE10043350(A1) |
申请公布日期 |
2002.04.04 |
申请号 |
DE20001043350 |
申请日期 |
2000.08.22 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
GERSTMEIER, GUENTER;RICHTER, FRANK;ROSSKOPF, VALENTIN |
分类号 |
G11C29/00;H01L23/544;(IPC1-7):H01L21/66 |
主分类号 |
G11C29/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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