发明名称 Process for studying structures on a wafer places circuits with test structures on the wafer light mask to detect electric parameters
摘要 A process for studying structures on a wafer which have been produced using a light mask on the wafer comprises having the test circuits (4) and test structures placed on the mask in a given reference position. The test and/or the illumination process evaluate a place-dependent electrical parameter.
申请公布号 DE10043350(A1) 申请公布日期 2002.04.04
申请号 DE20001043350 申请日期 2000.08.22
申请人 INFINEON TECHNOLOGIES AG 发明人 GERSTMEIER, GUENTER;RICHTER, FRANK;ROSSKOPF, VALENTIN
分类号 G11C29/00;H01L23/544;(IPC1-7):H01L21/66 主分类号 G11C29/00
代理机构 代理人
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