发明名称 Micro-etching composition for copper or copper alloy, micro-etching method, and method for manufacturing printed circuit board
摘要 A micro-etching composition and a printed circuit board fabricated by using the micro-etching composition are provided. The micro-etching composition, comprising a main ingredient consisting of sulfuric acid and hydrogen peroxide and an assisting ingredient consisting of phenyltetrazole and a chloride ion source, can continuously treat the surface of copper and copper alloys to produce fine microscopic pits for improved adhesion to resins without producing a brown or black deposit. The printed circuit board exhibits excellent adhesion between inner layer circuit patterns and insulation resin layers, and is free from haloing.
申请公布号 US2002038790(A1) 申请公布日期 2002.04.04
申请号 US20010912318 申请日期 2001.07.26
申请人 MEC CO., LTD. 发明人 KURII YOSHIHIRO;KAMEDA ETSUJI;NAKAMURA SACHIKO
分类号 C23F1/18;H05K3/38;(IPC1-7):H01B13/00;C03C15/00;C03C25/68;C23F1/00;C25F3/00 主分类号 C23F1/18
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