发明名称 |
PROCESS CHAMBER LID OPEN EQUIPMENT |
摘要 |
Provided herein is a lid assembly for chemical vapor deposition (CVD) process chamber, comprising a moveable lid, two linear guide rollers connected to the lid, one or more linear lifting actuators, and a rotation actuator connected to the axis of the lid. This lid assembly may be used for opening/closing process chamber as well as wet-cleaning process chamber in chemical vapor deposition. |
申请公布号 |
WO0227061(A2) |
申请公布日期 |
2002.04.04 |
申请号 |
WO2001US29889 |
申请日期 |
2001.09.24 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
KURITA, SHINICHI;BLONIGAN, WENDELL, T. |
分类号 |
C23C16/44;H01L21/205;H01L21/687 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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