发明名称 |
Optical inspection apparatus for defect detection |
摘要 |
A method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected at a relatively high speed and with a relatively low spatial resolution, and a second phase of optically examining with a relatively high spatial resolution only the suspected locations for the presence or absence of a defect therein.
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申请公布号 |
US2002039436(A1) |
申请公布日期 |
2002.04.04 |
申请号 |
US20010765995 |
申请日期 |
2001.01.19 |
申请人 |
ALUMOT DAVID;NEUMANN GAD;SHERMAN RIVKA;TIROSH EHUD |
发明人 |
ALUMOT DAVID;NEUMANN GAD;SHERMAN RIVKA;TIROSH EHUD |
分类号 |
G01N21/94;G01N21/95;G01N21/956;(IPC1-7):G06K9/00;G06K9/68;G06K9/64 |
主分类号 |
G01N21/94 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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